Equipment : Nanofab Sputtering System #2
- Five targets, RF or DC, 5" or 75 mm
- Single substrate, 1" wafer or smaller
- Substrate heater, up to 800 °C
- Programmable substrate positioning and multilayer timing
- Variable target-substrate distance
- 8" cryo pump
- 500 W DC power supplies, 600 W RF power supplies, substrate bias
- Secondary sputtering gas available
Available Targets: Please discuss with the staff.
Please consult Nanofab staff for process specifics.