Equipment : Nanofab Sputtering System #3
- Five targets, RF or DC, 5" or 75 mm
- Up to five substrates, 1" 2" and 3" wafers
- Programmable substrate positioning
- Variable target-substrate distance
- 8" cryo pump
- 500 W DC power supplies, 600 W RF power supplies, substrate bias
- Secondary sputtering gas available
Available Targets: Please discuss with the staff.
Please consult Nanofab staff for process specifics.