Equipment : Nanofab 6-Target Co-Depo Sputtering System
- Six targets, 75 mm, up to 3 targets co-deposition
- Single substrate, up to 4" wafer
- Load-lock, cryogenic water pump, 10" cryo pump, 200 mm turbo pump
- Substrate heater (800°C max.), cooling station
- In situ infrared substrate temperature measurement
- 500 W DC power supplies, 600 W RF power supplies, substrate bias
Available Targets: Please discuss with the staff.
Please consult Nanofab staff for process specifics.