Equipment : Nanofab 6-Target Co-Depo Sputtering System


  • Six targets, 75 mm, up to 3 targets co-deposition
  • Single substrate, up to 4" wafer
  • Load-lock, cryogenic water pump, 10" cryo pump, 200 mm turbo pump
  • Substrate heater (800°C max.), cooling station
  • In situ infrared substrate temperature measurement
  • 500 W DC power supplies, 600 W RF power supplies, substrate bias

Available Targets: Please discuss with the staff.

Please consult Nanofab staff for process specifics.

Tool image(s)