Equipment : Perkin Elmer 8L Sputtering System
- Three targets, 5" RF or DC, 6" RF
- 8" substrate table, sputter down configuration
- 8" cryo pump
- 500 W DC power supply, 600 W RF power supply, sputter etch
- Secondary sputtering gas available: Nitrogen
Available Targets: Please discuss with the staff.
Please consult Nanofab staff for process specifics.