Equipment : Perkin Elmer 8L Sputtering System


  • Three targets, 5" RF or DC, 6" RF
  • 8" substrate table, sputter down configuration
  • 8" cryo pump
  • 500 W DC power supply, 600 W RF power supply, sputter etch
  • Secondary sputtering gas available: Nitrogen

Available Targets: Please discuss with the staff.

Please consult Nanofab staff for process specifics.

Tool image(s)