Equipment : 8' Developer Wet Bench
- For photoresist developers only - no solvents.
- Note: SU-8 and PMMA should be developed at the solvent bench
- Exhausted bench top and sinks
- DI and city water taps, DI water and nitrogen guns
- Ultrasonic bath, process timers
- CEE 100 Spray Developer mounted in the bench
Please consult Nanofab staff for process specifics.