Equipment : 8' Developer Wet Bench


  • For photoresist developers only - no solvents.
  • Note: SU-8 and PMMA should be developed at the solvent bench
  • Exhausted bench top and sinks
  • DI and city water taps, DI water and nitrogen guns
  • Ultrasonic bath, process timers
  • CEE 100 Spray Developer mounted in the bench

Please consult Nanofab staff for process specifics.

Tool image(s)