Equipment : 8' Solvent Wet Bench (Bay 2)

Overview

  • For solvent processing only - no acids.
  • Exhausted bench top and sinks
  • Nitrogen guns, small sample cleaning station, vacuum tweezers
  • Ultrasonic bath, process timers
  • Photoresist stripper bath - Shipley 1165 at 50 °C

Please consult Nanofab staff for process specifics.

Tool image(s)