Equipment : 8' Solvent Wet Bench (Wet Chemistry Bay)


  • For solvent cleaning and photoresist spinning
  • No developers except for SU-8 and PMMA
  • CEE 100CB spinner/hotplate and Solitec spinner mounted in the bench
  • Exhausted bench top and wells
  • Nitrogen guns, ultrasonic bath, process timers

Please consult Nanofab staff for process specifics.

Tool image(s)