Equipment : CEE 100CB Bench Mounted Spinner/Hotplate


  • Handles substrates from 1 cm² to 4" wafers
  • To be used for standard positive photoresists only
  • Spin speed up to 5000 rpm
  • Programmable with up to 10 process steps
  • Programmable vacuum hotplate for baking photoresist
  • Mounted in an exhausted wet bench

Please consult Nanofab staff for process specifics.

Tool image(s)