Equipment : CEE 100CB Bench Mounted Spinner/Hotplate
- Handles substrates from 1 cm² to 4" wafers
- To be used for standard positive photoresists only
- Spin speed up to 5000 rpm
- Programmable with up to 10 process steps
- Programmable vacuum hotplate for baking photoresist
- Mounted in an exhausted wet bench
Please consult Nanofab staff for process specifics.