Equipment : CVC Connexion 6-Target Sputtering System

Overview

  • Six targets, 12" or 5", DC Magnetron
  • Five wafer tray cassette elevator
  • Each tray holds any size sample up to one 6" wafer
  • Load-lock, Central Wafer Handler, GMR chamber
  • Two cryogenic water pumps, 10" cryo pump, dry mechanical pump
  • Perpendicular or Parallel applied magnetic field on substrate
  • Computer control, programmable recipes
  • 1500 W DC power supply, 500 W RF bias power supply

Available Targets: Ta, Co, AlSiCu, NiFe, Ni, Cu, FeCo, IrMn, Cr.

Please consult Nanofab staff for process specifics.

Tool image(s)