Equipment : FEI Sirion 400 SEM
- Ultra high resolution FE-SEM with 2 nm resolution
- Motorized stage with full travel over a 100 mm wafer, 60° tilt
- JC Nabity Nanometer Pattern Generation System (NPGS) e-beam lithography
- Writes lithography patterns down to less than 15 nm
- PMMA and developer in stock for e-beam lithography
- NPGS and CAD software available for office use
Please consult Nanofab staff for process specifics.