Equipment : Commonwealth Scientific Ion Beam Deposition System

Overview

  • Three targets, 6", water cooled
  • Two permanent magnet Kaufman-type ion beam guns
  • 16 cm gun for substrate etching
  • 8 cm gun for target deposition
  • CSC IBS 600 power supplies
  • Secondary sputtering gas available: Nitrogen

Available Targets: Please discuss with the staff.

Please consult Nanofab staff for process specifics.

Tool image(s)