Equipment : Plasma-Therm 790 RIE
- Typically used for etching oxide, nitride, and silicon
- 500 W RF power supply
- 6" water cooled sample table
Note: Staff approval must be given EVERY TIME this machine is to be used.
Available Gases: SF6, CF4, CHF3, O2, Ar.
Please consult Nanofab staff for process specifics.