Equipment : STS Aspect ICP RIE

Overview

  • One of two process chambers on the Aspect cluster tool
  • RIE with Inductively Coupled Plasma
  • 3 kW coil power supply, 1 kW platen power supply
  • 12 wafer cassette, 150 mm wafers
  • Two loadlocks, central wafer dealer

Note: Staff approval must be given EVERY TIME this machine is to be used.

Available Gases: Discuss with the staff.

Please consult Nanofab staff for process specifics.

Tool image(s)