Equipment : Ultek E-Beam Evaporator


  • Four hearths, 7 cc
  • Accommodates any size substrate up to a 6" wafer
  • Variable target-substrate distance
  • Quartz crystal thickness monitor
  • 10 kV power supply, up to 300 mA beam current
  • 8" cryo pump

Available Targets: Au, Au, Ti, Pt, Ni, Ta, Cr.

Please consult Nanofab staff for process specifics.

Tool image(s)