Equipment : Leybold Heraeus Z-400 #2
- Four targets, 75 mm, RF or DC
- Up to 2" wafer
- Turbo pump
- Substrate heater (850°C max.)
- 500 W DC power supplies, 600 W RF power supplies, substrate bias
Available Targets: Please discuss with the staff.
Please consult Nanofab staff for process specifics.