Equipment : Leybold Heraeus Z-650


  • Two chambers, one 5" target or two 75 mm targets each
  • Load-lock; liquid nitrogen Meissner traps and turbo pump on each chamber
  • 500 W DC power supplies, 600 W RF power supplies, sputter etch
  • Advanced Energy Pinnacle Plus Pulsed DC power supply
  • Secondary gas available: methane

Available Targets: Please discuss with the staff.

Please consult Nanofab staff for process specifics.

Tool image(s)