Carnegie Mellon University

6-Target Nanofab Sputtering System 

  • Six targets, 75 mm, up to 3 targets co-deposition
  • Single substrate, up to 4" wafer
  • Load-lock, cryogenic water pump, 10" cryo pump, 200 mm turbo pump
  • Substrate heater (800°C max.), cooling station
  • In situ infrared substrate temperature measurement
  • 500 W DC power supplies, 600 W RF power supplies, substrate bias
Available Targets: Please discuss with the staff.
Please consult Nanofab staff for process specifics.