Carnegie Mellon University ———
College of Engineering  ›  Claire & John Bertucci Nanotechnology Laboratory  ›  Facilities & Equipment  ›  Equipment

Equipment

The Nanofab provides up to 100 processing tools to the community, all of which are supported through user fees, with new acquisitions supplemented by internal university funds and research grants from faculty. Researchers using the Nanofab can rely on six technical staff members to guide them by providing hands-on experience, helping them choose the best tools and processes for their research. Staff members also assist with tool training, process development, tool maintenance, and tool repair, providing expertise in lithography, film deposition, etching, metrology, annealing, and more. Contact the lab for more details.

Machine List

5-Target Nanofab Sputtering System #1
5-Target Nanofab Sputtering System #2
5-Target Nanofab Sputtering System #3
5-Target Nanofab Sputtering System #4
5-Target Nanofab Sputtering System #5
6-Target Nanofab Sputtering System
Anatech Hummer Gold Coater
Cambridge Nanotech Fiji Atomic Layer Deposition System
Commonwealth Scientific Ion Beam Deposition System
CVC Connexion Sputtering System
Leybold Heraeus Z-400 Sputtering System
Leybold Heraeus Z-400 Sputtering System #2
Leybold Heraeus Z-650 Sputtering System
Perkin Elmer 6J Sputtering System
Perkin Elmer 8L Sputtering System
SCS Labcoter 2 Parylene Deposition System
Tegal AMS Aluminum Nitride Sputtering System
Trion Orion II PECVD
Ultek E-Beam Evaporator
GVD iCVD System
GVD oCVD System
Kurt Lesker PVD 75 Electron Beam Evaporator 
Kurt Lesker PVD 75 Sputtering System
Plasma-Therm Versaline ICP RIE
STS Aspect AOE
STS Aspect ICP
STS Multiplex ICP RIE
Micrion 2500 Focused Ion Beam System
Commonwealth Scientific Ion Mill
Commonwealth Scientific Ion Mill #2
Plasma-Therm 790 RIE
Trion Phantom II RIE
IPC Barrel Etcher
Samco UV-1 Ozone Cleaner 
FEI Sirion 600 SEM / JC Nabity NPGS E-Beam Lithography
FEI Sirion 400 SEM / JC Nabity NPGS E-Beam Lithography
Elionix ELS-G100 Electron Beam Lithography System
Nikon NSR-1505G4 Stepper
Heidelberg DWL 66FS Laser Lithography System
Heidelberg DWL 66 Laser Lithography System
Karl Süss MA6/BA6 Contact Aligner
Karl Süss MA56 Contact Aligner
Karl Süss MJB3 Contact Aligner
YES HMDS Vapor Prime Vacuum Oven
CEE 100 Spray Developer
CEE 100CB Table Top Spinner/Hotplate
CEE 100CB Bench Mount Spinner/Hotplate
Solitec Photoresist Spinner
Despatch Convection Oven - 90 ºC
Blue M Oven - 120 ºC
Photoresist Refrigerator
ASML 5500/80 i-Line Wafer Stepper
AG Heat Pulse 610i Rapid Thermal Annealer
Micro Magnetics SpinTherm 1000 Magnetic Annealing System
2" Tube Annealing Furnace
Blue M Variable Temp Ovens
Hotpack Vacuum Oven
Hotplates
FEI Sirion 600 SEM / JC Nabity NPGS E-Beam Lithography
FEI Sirion 400 SEM / JC Nabity NPGS E-Beam Lithography
Olympus MX80 Inspection Microscope
Olympus BH Inspection Microscope
Olympus Widefield Zoom Microscope
Micromanipulator Probe Stations
KLA Tencor P-15 Profilometer
Tencor P-2 Profilometer
Tencor Alpha-Step 200 Profilometer
Nanometrics Nanospec 210XP
Semitool 870 Spin Rinser/Dryer
Semitool 880 Spin Rinser/Dryer
Semitool 270 Spin Rinser/Dryer
Tousimis Critical Point Dryer
Copper Electroplating Bath
Kulicke & Soffa 782-6 Dicing Saw
Micromech Diamond Saw
Strasbaugh 6EC CMP

Equipment Calendars

Cambridge Fiji ALD

Perkin Elmer 6J

Perkin Elmer 8L

Sirion 400 SEM

Sirion 600 SEM

Ultek E-Beam Evaporator

SCS Labcoter 2 Parylene