Carnegie Mellon University ———
College of Engineering  ›  Claire & John Bertucci Nanotechnology Laboratory  ›  Facilities & Equipment  ›  ASML 5500/80 i-Line Wafer Stepper

ASML 5500/80 i-Line Wafer Stepper 

Overview
  • 500nm resolution and <70nm alignment accuracy
  • Set up for 4” wafers but convertible to 3” or 6” platforms
  • 21mm x 21mm field size
  • 1.3µm depth of focus
Please consult Nanofab staff for process specifics. 
ASML 5500/80 i-Line Wafer Stepper  
ASML 5500/80 i-Line Wafer Stepper

ASML 5500/80 i-Line Wafer Stepper