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Claire & John Bertucci Nanotechnology Laboratory
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Claire & John Bertucci Nanotechnology Laboratory
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Facilities & Equipment
› ASML 5500/80 i-Line Wafer Stepper
ASML 5500/80
i
-Line Wafer Stepper
Overview
500nm resolution and <70nm alignment accuracy
Set up for 4” wafers but convertible to 3” or 6” platforms
21mm x 21mm field size
1.3µm depth of focus
Please consult
Nanofab staff
for process specifics.
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Claire & John Bertucci Nanotechnology Laboratory
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