Carnegie Mellon University

CEE 100 Spray Developer

  • Handles 3" or 4" wafers
  • Uses either AZ400K Developer 1:3, or AZ Developer 2:1
  • Programmable with up to 10 process steps
  • Custom sample holders help dry the wafer backside after development
  • Mounted in an exhausted wet bench
Please consult Nanofab staff for process specifics.