Carnegie Mellon University ———
College of Engineering  ›  Claire & John Bertucci Nanotechnology Laboratory  ›  Facilities & Equipment  ›  Strasbaugh 6EC CMP

Strasbaugh 6EC CMP

Overview
  • Substrate chucks for 3" and 4" wafers
  • Fully programmable sweep, downpressure, table speed, time, slurry flow
Please consult Nanofab staff for process specifics. 

 Strasbaugh 6EC CMP