Carnegie Mellon University ———
College of Engineering  ›  Claire & John Bertucci Nanotechnology Laboratory  ›  Facilities & Equipment  ›  Tousimis Automegasamdri-915B Critical Point Dryer

Tousimis Automegasamdri-915B Critical Point Dryer

Overview
  • Automated critical point drying system
  • Any substrate up to 150 mm wafer
Please consult Nanofab staff for process specifics.