Carnegie Mellon University

FEI Sirion 400 SEM / JC Nabity NPGS E-Beam Lithography

  • Ultra high resolution FE-SEM with 2 nm resolution
  • Motorized stage with full travel over a 100 mm wafer, 60° tilt
  • JC Nabity Nanometer Pattern Generation System (NPGS) e-beam lithography
  • Writes lithography patterns down to less than 15 nm
  • PMMA and developer in stock for e-beam lithography
  • NPGS and CAD software available for office use
Please consult Nanofab staff for process specifics.