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Claire & John Bertucci Nanotechnology Laboratory
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College of Engineering
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Claire & John Bertucci Nanotechnology Laboratory
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Facilities & Equipment
› Nikon NSR-1505G4 Stepper
Nikon NSR-1505G4 Wafer Stepper
Overview
5x reduction
5" reticle, 4" wafers
g-line UV
better than 750 nm resolution
better than 150 nm alignment
Please consult
Nanofab staff
for process specifics.
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Claire & John Bertucci Nanotechnology Laboratory
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