Carnegie Mellon University ———
College of Engineering  ›  Claire & John Bertucci Nanotechnology Laboratory  ›  Facilities & Equipment  ›  Nikon NSR-1505G4 Stepper

Nikon NSR-1505G4 Wafer Stepper

Overview
  • 5x reduction
  • 5" reticle, 4" wafers
  • g-line UV
  • better than 750 nm resolution
  • better than 150 nm alignment
Please consult Nanofab staff for process specifics. 

Nikon NSR-1505G4 Stepper