Carnegie Mellon University

Kurt Lesker PVD 75 Electron Beam Evaporator

Overview
  • Load-lock with auto transfer
  • 6” wafer capability
  • 8 pockets (8cc each)
  • Dual crystal monitors
  • Water cooled rotary substrate
  • 16”-24” variable throw height
  • RF sputter etch on substrate
  • Computer automation
Please consult Nanofab staff for process specifics.