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Claire & John Bertucci Nanotechnology Laboratory
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Claire & John Bertucci Nanotechnology Laboratory
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Facilities & Equipment
› Kurt Lesker PVD 75 Sputtering System
Kurt
Lesker
PVD 75 Sputtering System
Overview
Load-lock with auto transfer
6” wafer capability
6 targets (3” diameter)
Co-sputtering up to 4 sources
800C substrate heater
RF or DC sputtering
RF sputter etch on substrate
Computer automation
Please consult
Nanofab staff
for process specifics.
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Claire & John Bertucci Nanotechnology Laboratory
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