Carnegie Mellon University

Karl Süss MA6/BA6 Contact Aligner

Overview
  • Top-side and bottom-side aligner plus Near Field Holography option
  • chip/3", 4", and 6" wafer trays
  • 4", 5", and 7" mask holders
  • UV300 filter, 320 nm at 5 mW/cm2
  • CCD camera output to video monitor
  • Motorized microscopes, micrometer driven wafer stage with 0.5 μm alignment
Please consult Nanofab staff for process specifics.