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College of Engineering  ›  Claire & John Bertucci Nanotechnology Laboratory  ›  Facilities & Equipment  ›  AG Heat Pulse 610i Rapid Thermal Annealer

AG Heat Pulse Rapid Thermal Annealer

Overview
  • 5" thermocouple wafer used as sample table
  • Recipes calibrated for 300 °C to 1100 °C in 50 °C steps
Available gases: Oxygen, Nitrogen, Argon, Forming Gas
Please consult Nanofab staff for process specifics. 

AG Heat Pulse Rapid Thermal Annealer