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College of Engineering  ›  Claire & John Bertucci Nanotechnology Laboratory  ›  Facilities & Equipment  ›  Solitec Photoresist Spinner

Solitec Photoresist Spinner

Overview
  • Handles substrates from 1 cm² to 4" wafers
  • May be used for positive photoresist, PMMA, and SU-8
  • Spin speed up to 5000 rpm
  • Two step program with spread and spin steps
  • Mounted in an exhausted wet bench
Please consult Nanofab staff for process specifics. 

Solitec Photoresist Spinner