Carnegie Mellon University

Solitec Photoresist Spinner

  • Handles substrates from 1 cm² to 4" wafers
  • May be used for positive photoresist, PMMA, and SU-8
  • Spin speed up to 5000 rpm
  • Two step program with spread and spin steps
  • Mounted in an exhausted wet bench
Please consult Nanofab staff for process specifics.