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College of Engineering  ›  Claire & John Bertucci Nanotechnology Laboratory  ›  Facilities & Equipment  ›  STS Multiplex ICP RIE

STS Aspect ICP RIE

Overview
  • Bosch process license for anisotropic silicon etch
  • Isotropic silicon etch
  • RIE with Inductively Coupled Plasma
  • 1200 W coil power supply, 300 W platen power supply
  • Four wafer carousel, 4" wafers
Note: Staff approval must be given EVERY TIME this machine is to be used.

Available Gases: SF6, C4F8, O2, Ar.
Please consult Nanofab staff for process specifics. 

 

STS Multiplex ICP RIE