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Claire & John Bertucci Nanotechnology Laboratory
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Facilities & Equipment
› Trion Phantom II RIE
Trion Phantom II RIE
Overview
Typically used for etching oxide, nitride, and silicon
600 W RF power supply
6" water cooled sample table
Available Gases:
SF
6
, CF
4
, CHF
3
, O
2
, Ar.
Please consult
Nanofab staff
for process specifics.
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Claire & John Bertucci Nanotechnology Laboratory
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