Carnegie Mellon University ———
College of Engineering  ›  Claire & John Bertucci Nanotechnology Laboratory  ›  Facilities & Equipment  ›  Trion Phantom II RIE

Trion Phantom II RIE

Overview
  • Typically used for etching oxide, nitride, and silicon
  • 600 W RF power supply
  • 6" water cooled sample table
Available Gases: SF6, CF4, CHF3, O2, Ar.
Please consult Nanofab staff for process specifics. 

Trion Phantom II RIE