Plasma-Therm Versaline ICP RIE
Overview- Typically used for etching aluminum and aluminum nitride
- 500 W RF power supply
- 4" wafers or smaller samples mounted to 4" carrier wafers
Note: Staff approval must be given EVERY TIME this machine is to be used.
Available Gases: Cl2, BCl3, Ar, O2.
Please consult Nanofab staff for process specifics.