Carnegie Mellon University
Leybold Heraeus Z-400 Sputtering System #2

  • Four targets, 75 mm, RF or DC
  • Up to 2'' wafer
  • Turbo pump
  • Substrate heater (850°C max.)
  • 500 W DC power supplies, 600 W RF power supplies, substrate bias

Note: Time on the Z-400 is scheduled by the staff. Contact them for reservations.

Available Targets: Please discuss with the staff.
Please consult Nanofab staff for process specifics.