Leybold Heraeus Z-400 Sputtering System #2
Overview
Overview
- Four targets, 75 mm, RF or DC
- Up to 2'' wafer
- Turbo pump
- Substrate heater (850°C max.)
- 500 W DC power supplies, 600 W RF power supplies, substrate bias
Note: Time on the Z-400 is scheduled by the staff. Contact them for reservations.
Available Targets: Please discuss with the staff.
Please consult Nanofab staff for process specifics.
