Carnegie Mellon University
Leybold Heraeus Z-650 Sputtering System 

  • Two chambers, one 5" target or two 75 mm targets each
  • Load-lock; liquid nitrogen Meissner traps and turbo pump on each chamber
  • 500 W DC power supplies, 600 W RF power supplies, sputter etch
  • Advanced Energy Pinnacle Plus Pulsed DC power supply
  • Secondary gas available: methane
Available Targets: Please discuss with the staff.
Please consult Nanofab staff for process specifics.